Tubing for Semiconductor Applications

The problem: Particulation of tubing into CMP slurries reduces product yields Tubing used in flow control pinch valves and peristaltic pumps can shed particles when exposed to abrasive chemical mechanical planarization (C......The problem: Particulation of tubing into CMP slurries reduces product yields Tubing used in flow control pinch valves and peristaltic pumps can shed particles when exposed to abrasive chemical mechanical planarization (CMP) operations. Slurries that contain debris and other particulates often produce micro scratches on the surface of the wafers leading to a decrease in product yields.