HPBC 2.0 Technology

Tairay silicon wafer + HPBC 2.0 technology achieves a maximum efficiency of 27%, representing the final 1% absolute efficiency breakthrough for crystalline silicon cells.

Unafraid of High Temperatures

Power temperature coefficient of -0.26%/℃ superior power generation performance under high temperatures.

Shadow Resistance & Local Hot Spot Prevention

Unafraid of shadow blocking, lower power loss

Prevents local hot spots, eliminates fire hazards

OBB Technology

Innovative OBB structure

No front-side busbars and no rear-side main busbars.