en.Wedoany.com Reported - The Russian Ministry of Industry and Trade (Минпромторг) has allocated nearly 2 billion rubles through two tenders for the development and production of electron beam lithography and lift-off lithography materials required for manufacturing microelectronics and microwave components.

The first tender, valued at 1.017 billion rubles, is for the development of electron beam lithography materials; the second tender, valued at 889.5 million rubles, is for the development of lift-off lithography materials. Both projects must be completed by November 2029.

Under the "Microwave Resist-1" (СВЧ Резист-1) project, plans are in place to develop 12 types of electron beam resists to replace products from Germany's Allresist and Microresist companies, Japan's ZEON Corporation, and the United States' MicroChem Corporation. The "Microwave Resist-2" (СВЧ Резист-2) project aims to develop seven materials to replace the American LOR and PMGI series resists. The documents note that Russia currently lacks domestic production capabilities for such materials, with scientific and industrial needs previously relying on foreign supplies. Electron beam lithography enables the fabrication of ultra-precise structures with nanometer-scale resolution and is widely used in the development of chips and photomasks. Lift-off lithography is used to form metal structures in microelectronics and has significant applications in microwave and power electronics.

This new round of tenders is a continuation of the import substitution program for microelectronic materials. Previously, the Russian Ministry of Industry and Trade had allocated funds for the development of photoresists, specialty gases, and chemical materials required for integrated circuits and semiconductor components.

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